Published on February 20, 2013 | by Myriah Towner0
UAL recognised for leading fashion role
UAL has been recognised as a leading university for nurturing cutting-edge fashion in a new industry book.
PATTERN: 100 Fashion Designers, 10 Curators showcases 100 of the most exceptional fashion designers from the top fashion capitals; Paris, London, Milan and New York.
PATTERN explains the processes behind different collections and exposes unseen archive sketches, as well as candid and backstage photographs.
Those featured were selected by other leading designers, editors, stylists, and educators, including CSM lecturer Heather Sproat.
Sproat told ALN: “I think the fact that so many of the designers, chosen by an international selection of experts, were graduates from CSM stands as testament to the richness and creative strength of art and design education that allows us to germinate and nurture talent here.”
History of knowledge
Willie Walters, course director of BA Fashion at CSM explained why UAL graduates are so prominent in the fashion industry.
She said: “Our success is the consequence of 70 years of building a unique educational environment that nourishes creative talent at the highest level and expects and demands the most exacting standards and dedication from students and staff alike.”
“We ask students to answer the questions with their own original thoughts. We are often blown away by their solutions.” CSM lecturer Heather Sproat
Recently showing during London Fashion Week, both LCF and CSM have been gaining international attention for the work of its students and graduates.
LCF believes that encouraging industry experience has led to the success of many alumni.
Sproat said that the reason why so many students go on to be successful after university is largely due to CSM’s teaching methods.
She said: “We teach without limits on creativity and ask students to answer the questions that we pose with their own original thoughts. We are often blown away by their solutions.
“I work amongst a team of incredibly dedicated and inspirational staff. I consider myself privileged to come and be paid to work with such a challenging, directional and talented bunch of students.”
London Fashion Week
Roksanda Illincic and Todd Lynn, who both recently showed their collections at London Fashion Week, represent UAL talent in the book as well.
Rahull Verma, 26, a LCF MA Fashion Design Technology graduate spoke to ALN about being a part of such an established university.
“My career is being shaped by those experts who once mentored designers like Alexander McQueen and Christopher Kane.” LCF student Rahull Verma
Verma said: “Being part of UAL, which has already produced such an array of great designers, naturally gives me the confidence that I am at the right place because my career is being shaped by those experts who once mentored designers like Alexander McQueen, Christopher Kane and J.W. Anderson.”
“I aspire to become like them and strive to match up the standards they have set in the past,” he added.
This isn’t the first time the two colleges have been hailed as world leaders, global multimedia network Fashion TV named the colleges two of the most influential design universities.
ALN readers can get 30 per cent off PATTERN: 100 Fashion Designers, 10 Curators by ringing Phaidon publishers on 020 7843 1234 or by clicking here and quoting PUAL001, offer ends May 1 2013.
Central Saint Martins graduates featured in PATTERN: 100 Fashion Designers, 10 Curators
Christopher Kane, Christopher Shannon, Craig Lawrence, David Koma, Emilio de la Morena, Erika Trotzig, Flaminia Saccucci, Fleet Ilya, Gareth Pugh, Graeme Armour, Huishan Zhang, Joseph Li, Kim Jones, Louise Gray, Marios Schwab, Mark Fast, Marques’ Almeida, Mary Katrantzou, Meadham Kirchoff, Michael van der Ham, Umit Benan, Nicholas Kirkwood, Phoebe English, Richard Nicoll, Roksanda Illincic, Sarah Burton, Sharon Wauchob, Uma Wang, Thomas Tait, Qui Hao, Maarten van der Horst, Shaun Samson, Simone Rocha, and Yang Li.
London College of Fashion graduates in PATTERN: 100 Fashion Designers, 10 Curators
J.W. Anderson, Lucas Nascimento, and James Long.